Numerical Simulation of 2D Atom Lithography Via Monte Carlo Method

Abstract:

The fabrication of nanodots spaced by half the wavelength can furthur put forwards the development of nanoscale length transfer standard. Focusing and deposition characteristics of quadratic optical lattice formed by two orthogonal standing waves with parallel polarization are numerically analyzed via particle optics model.The initial condition is selected stochastically. Three dimensional（3D）structures of nanodots are studied under different laser power and transverse Gaussian divergence.The effects on nanodots with different deposition positions are also discussed. It is shown that good numercal result can be obtained in immersion lens and channeling regime.Transverse angular distribution and the deposition position dominantly determine the quality of the nanodots.

Key words:Laser optics;atom lithography; nanometrology; nanodot; Monte Carlo method