Application of Petri-net Technique in Modeling of Semiconductor Wafer Fabrication
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TN305

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    Abstract:

    The recent research progress of Petri-net-based modeling for semiconductor wafer fabrication is presented,including the important characteristics of semiconductor wafer fabrication,modeling approach,modes of Petri-net,scheduling methods and real application.Finally,the paper presents some problems worthy of further study and probably developing trends in the semiconductor manufacturing field.

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CAO Zhengcai, QIAO Fei, WU Qidi. Application of Petri-net Technique in Modeling of Semiconductor Wafer Fabrication[J].同济大学学报(自然科学版),2008,36(12):

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